Atomic Layer Deposition of Alumina on Silicon Nanotrees, towards the development of 3D ultrastable Aqueous Si Microsupercapacitor - CEA - Commissariat à l’énergie atomique et aux énergies alternatives Access content directly
Conference Papers Year : 2018

Atomic Layer Deposition of Alumina on Silicon Nanotrees, towards the development of 3D ultrastable Aqueous Si Microsupercapacitor

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cea-01993877 , version 1 (25-01-2019)

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  • HAL Id : cea-01993877 , version 1

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Anthony Valero, Dorian Gaboriau, P. Gentile, Saïd Sadki. Atomic Layer Deposition of Alumina on Silicon Nanotrees, towards the development of 3D ultrastable Aqueous Si Microsupercapacitor. 233rd ECS MEETING, May 2018, Seattle, WA, United States. ⟨cea-01993877⟩
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