Successes and challenges in applications of a laboratory-based scanning XPS/HAXPES instrument
Résumé
X-ray Photoelectron Spectroscopy (XPS) is a widely used surface analysis technique with many well-established industrial and research applications, including nanoelectronics. The surface sensitivity (top 5-10 nm) of XPS and its ability to provide short-range chemical bonding information makes the technique extremely popular in the characterization of electronic materials. While its surface sensitivity is an important attribute, in some cases, the depth of analysis of XPS is not sufficient to analyze buried interfaces without first sputtering the sample surface. The interfaces of interest for characterization or metrology are often buried underneath metal electrodes or oxide layers and/or localized in small areas, which has been an increasing challenge for XPS.
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