DNA Origami Mask for Sub-Ten-Nanometer Lithography - CEA - Commissariat à l’énergie atomique et aux énergies alternatives Access content directly
Journal Articles ACS Nano Year : 2016
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cea-02074329 , version 1 (20-03-2019)

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Cheikh Tidiane Diagne, Christophe Brun, Didier Gasparutto, Xavier Baillin, Raluca Tiron. DNA Origami Mask for Sub-Ten-Nanometer Lithography. ACS Nano, 2016, 10 (7), pp.6458-6463. ⟨10.1021/acsnano.6b00413⟩. ⟨cea-02074329⟩
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