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Journal Articles Optics Express Year : 2005

Polishing-induced contamination of fused silica optics and laser induced damage density at 351 nm

Abstract

In this paper we study the effect of contamination induced by fabrication process on laser damage density of fused silica polished parts at 351 nm in nanosecond regime. We show, owing to recent developments of our raster scan metrology, that a good correlation exists between damage
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Dates and versions

cea-01053354 , version 1 (30-07-2014)

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Jerome Neauport, L. Lamaignere, H. Bercegol, F. Pilon, J.-C. Birolleau. Polishing-induced contamination of fused silica optics and laser induced damage density at 351 nm. Optics Express, 2005, pp.10163-10171. ⟨10.1364/OPEX.13.010163⟩. ⟨cea-01053354⟩

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