Strong water repellency effect on SiO2 films processed at a nanometric scale - CEA - Commissariat à l’énergie atomique et aux énergies alternatives Access content directly
Journal Articles The European Physical Journal B: Condensed Matter and Complex Systems Year : 2008

Strong water repellency effect on SiO2 films processed at a nanometric scale

Abstract

The present study deals with the creation of nano-rough surfaces with stable and controlled high hydrophobicity. These surfaces were obtained by combining the ion track etching technique with a simple functionalization by grafting perfluoroctyltrichlorosilane (PFOTS) molecules. Surface morphology was investigated by AFM observations which evidenced a self-affine fractal structure with a fractal dimension Df ~ 2.6. The study of the wetting properties of these surfaces allowed to elucidate the conditions for observing a high hydrophobicity phenomenon and to predict the contact angle values for surfaces designed at a nanometric scale.

Dates and versions

cea-00372177 , version 1 (31-03-2009)

Identifiers

Cite

S.M.M. Ramos, Abdenacer Benyagoub, B. Canut, P. de Dieuleveult, G. Messin. Strong water repellency effect on SiO2 films processed at a nanometric scale. The European Physical Journal B: Condensed Matter and Complex Systems, 2008, 62, pp.405-410. ⟨10.1140/epjb/e2008-00182-1⟩. ⟨cea-00372177⟩
82 View
0 Download

Altmetric

Share

Gmail Facebook X LinkedIn More