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Structure: Internal structure identifier : 474316

Precise control of template affinity achieved by UV-assisted graphoepitaxy approach on silicon nanowires applications

Patricia Pimenta-Barros , Guillaume Claveau , Maxime Argoud , Zdenek Chalupa , Nacima Allouti , et al.
Novel Patterning Technologies 2018, Feb 2018, San Jose, Canada. pp.11, ⟨10.1117/12.2297407⟩
Conference papers cea-02185301v1