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authIdHal_s : olivier-soppera
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Hafnium Oxide Nanostructured Thin Films: Electrophoretic Deposition Process and DUV Photolithography Patterning

Vanessa Proust , Quentin Kirscher , Thi Kim Ngan Nguyen , Lisa Obringer , Kento Ishii , et al.
Nanomaterials, 2022, 12 (14), pp.2334. ⟨10.3390/nano12142334⟩
Journal articles hal-03773329v1

Water Soluble Resist for Deep-UV (193 nm) Lithography based on a Chitosan Biopolymer

Olha Sysova , Paule Durin , CORINNE GABLIN , Didier Léonard , Alexandre Téolis , et al.
JNTE, Nov 2022, Besancon, France, France
Conference papers hal-04151134v1

Hyperbranched polymers for photolithographic applications towards understanding the relationship between chemical structure of polymer resin and lithographic performances

Christos L. Chochos , Esma Ismailova , Cyril Brochon , Nicolas Leclerc , Ralouca Tiron , et al.
Advanced Materials, 2009, 21 (10), pp.1121-1125. ⟨10.1002/adma.200801715⟩
Journal articles hal-00446619v1

Interactions of water soluble Bio-sourced Resist with Fluorine Etching Plasmas during Photopatterning Processes

Paule Durin , CORINNE GABLIN , Aziz Benamrouche , Samar Hajjar-Garreau , Alexandre Teolis , et al.
JNTE, Nov 2022, Besançon, France, France
Conference poster hal-04151194v1
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Probing Plasmon-Induced Chemical Mechanisms by Free-Radical Nanophotopolymerization

Farid Kameche , Wajdi Heni , Siham Telitel , Loïc Vidal , Sylvie Marguet , et al.
Journal of Physical Chemistry C, 2021, 125 (16), pp.8719-8731. ⟨10.1021/acs.jpcc.1c01693⟩
Journal articles hal-03205875v1

193 nm photolithographic properties of chemically amplified photoresists with well-defined molecular structures

Hassam Ridaoui , Ali Dirani , Olivier Soppera , I. Ismailova , Cyril Brochon , et al.
26th InternationalConference of Photopolymer Science and Technology, Jun 2009, CHIBA, Japan
Conference papers hal-00411887v1

How chitosan can be considered as a promising eco-efficient candidate to replace commercial organic-based resists in the photolithography process. Focus on photopatterning and etching behavior in fluorinated plasmas

Didier Léonard , Paule Durin , Olha Sysova , Yue Guan , CORINNE GABLIN , et al.
Thermec, Jul 2023, Vienne, Austria
Conference papers hal-04151212v1

Water-soluble bio-sourced resists for DUVlithography in a 200/300mm pilot line environment Oral Presentation

Isabelle Servin , Alexandre Teolis , Arnaud Bazin , Paule Durin , Olha Sysova , et al.
ICPST, May 2022, Virtual, France
Conference papers hal-04151042v1

Chemically Amplified Photoresists for 193-Nm Photolithography: Effect of Molecular Structure and Photonic Parameters on Photopatterning

Hassan Ridaoui , Ali Dirani , Olivier Soppera , Esma Ismailova , Cyril Brochon , et al.
Journal of Polymer Science Part A: Polymer Chemistry, 2010, 48 (6), pp.1271-1277. ⟨10.1002/pola.23866⟩
Journal articles istex hal-00679919v1

The synthesis and formulation of photosensitive resins towards: low line edge roughness of high resolution photolithography patterns

Esma Ismailova , Christos L. Chochos , Cyril Brochon , Nicolas Leclerc , Christophe A. Serra , et al.
MNE 2008, Sep 2008, Athenes, Greece
Conference papers hal-00324377v1

Hyperbranched Polymers for Photolithographic Applications - Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances

Christos L. Chochos , Esma Ismailova , Cyril Brochon , Nicolas Leclerc , Raluca Tiron , et al.
Advanced Materials, 2009, 21 (10-11), pp.1121-1125. ⟨10.1002/adma.200801715⟩
Journal articles hal-00385767v1
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Chitosan as a Water-Developable 193 nm Photoresist for Green Photolithography

Olha Sysova , Paule Durin , Corinne Gablin , Didier Léonard , Alexandre Téolis , et al.
ACS Applied Polymer Materials, 2022, 4 (6), pp.4508-4519. ⟨10.1021/acsapm.2c00475⟩
Journal articles hal-03703059v1

Photolithography Processes with Photosensitive Resins for Semi-conductor Technologies with patterns smaller than 90 nm : physical chemical mechanisms inducing the pattern roughness

Olivier Soppera , B. Mortini , J.P. Gouy , C. Braut , Georges Hadziioanou
Journées J3N PNANO, Sep 2007, PARIS, France
Conference papers hal-00199229v1
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Plasmon-triggered living photopolymerization for elaboration of hybrid polymer/metal nanoparticles

Farid Kameche , Wajdi Heni , Siham Telitel , Dandan Ge , Loïc Vidal , et al.
Materials Today, 2020, 40, pp.38-47. ⟨10.1016/j.mattod.2020.03.023⟩
Journal articles cea-02874092v1

Hyperbranched Polymers for Photolithographic Applications - Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances

Christos L. Chochos , Esma Ismailova , Cyril Brochon , Nicolas Leclerc , Raluca Tiron , et al.
Advanced Materials, 2009, 21 (10-11), pp.1121-1125. ⟨10.1002/adma.200801715⟩
Journal articles hal-00945178v1

Multi-Shaped Nanoparticles Utilized as Sources of Surface Plasmon for Nanophotopolymerization

Xuan Zhou , Claire Deeb , Davy Gérard , Alexandre Bouhelier , Prashant Jain , et al.
GDR ondes: Journée GT2-Micro, nano-structures et dispositifs de l'optique aux micro-ondes, Feb 2012, Dijon, France
Conference papers hal-02498876v1
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Hybrid plasmonic nano-emitters with controlled single quantum emitter positioning on the local excitation field

Dandan Ge , Sylvie Marguet , Ali Issa , Safi Jradi , Tien Hoa Nguyen , et al.
Nature Communications, 2020, 11 (1), ⟨10.1038/s41467-020-17248-8⟩
Journal articles hal-02947022v1