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Hafnium Oxide Nanostructured Thin Films: Electrophoretic Deposition Process and DUV Photolithography Patterning
Vanessa Proust
,
Quentin Kirscher
,
Thi Kim Ngan Nguyen
,
Lisa Obringer
,
Kento Ishii
,
et al.
Journal articles
hal-03773329v1
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Water Soluble Resist for Deep-UV (193 nm) Lithography based on a Chitosan Biopolymer
Olha Sysova
,
Paule Durin
,
CORINNE GABLIN
,
Didier Léonard
,
Alexandre Téolis
,
et al.
JNTE, Nov 2022, Besancon, France, France
Conference papers
hal-04151134v1
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Hyperbranched polymers for photolithographic applications towards understanding the relationship between chemical structure of polymer resin and lithographic performances
Christos L. Chochos
,
Esma Ismailova
,
Cyril Brochon
,
Nicolas Leclerc
,
Ralouca Tiron
,
et al.
Journal articles
hal-00446619v1
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Interactions of water soluble Bio-sourced Resist with Fluorine Etching Plasmas during Photopatterning Processes
Paule Durin
,
CORINNE GABLIN
,
Aziz Benamrouche
,
Samar Hajjar-Garreau
,
Alexandre Teolis
,
et al.
JNTE, Nov 2022, Besançon, France, France
Conference poster
hal-04151194v1
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Probing Plasmon-Induced Chemical Mechanisms by Free-Radical Nanophotopolymerization
Farid Kameche
,
Wajdi Heni
,
Siham Telitel
,
Loïc Vidal
,
Sylvie Marguet
,
et al.
Journal articles
hal-03205875v1
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193 nm photolithographic properties of chemically amplified photoresists with well-defined molecular structures
Hassam Ridaoui
,
Ali Dirani
,
Olivier Soppera
,
I. Ismailova
,
Cyril Brochon
,
et al.
26th InternationalConference of Photopolymer Science and Technology, Jun 2009, CHIBA, Japan
Conference papers
hal-00411887v1
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How chitosan can be considered as a promising eco-efficient candidate to replace commercial organic-based resists in the photolithography process. Focus on photopatterning and etching behavior in fluorinated plasmas
Didier Léonard
,
Paule Durin
,
Olha Sysova
,
Yue Guan
,
CORINNE GABLIN
,
et al.
Thermec, Jul 2023, Vienne, Austria
Conference papers
hal-04151212v1
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Water-soluble bio-sourced resists for DUVlithography in a 200/300mm pilot line environment Oral Presentation
Isabelle Servin
,
Alexandre Teolis
,
Arnaud Bazin
,
Paule Durin
,
Olha Sysova
,
et al.
ICPST, May 2022, Virtual, France
Conference papers
hal-04151042v1
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Chemically Amplified Photoresists for 193-Nm Photolithography: Effect of Molecular Structure and Photonic Parameters on Photopatterning
Hassan Ridaoui
,
Ali Dirani
,
Olivier Soppera
,
Esma Ismailova
,
Cyril Brochon
,
et al.
Journal of Polymer Science Part A: Polymer Chemistry, 2010, 48 (6), pp.1271-1277. ⟨10.1002/pola.23866⟩
Journal articles
istex
hal-00679919v1
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The synthesis and formulation of photosensitive resins towards: low line edge roughness of high resolution photolithography patterns
Esma Ismailova
,
Christos L. Chochos
,
Cyril Brochon
,
Nicolas Leclerc
,
Christophe A. Serra
,
et al.
MNE 2008, Sep 2008, Athenes, Greece
Conference papers
hal-00324377v1
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Hyperbranched Polymers for Photolithographic Applications - Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances
Christos L. Chochos
,
Esma Ismailova
,
Cyril Brochon
,
Nicolas Leclerc
,
Raluca Tiron
,
et al.
Journal articles
hal-00385767v1
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Chitosan as a Water-Developable 193 nm Photoresist for Green Photolithography
Olha Sysova
,
Paule Durin
,
Corinne Gablin
,
Didier Léonard
,
Alexandre Téolis
,
et al.
Journal articles
hal-03703059v1
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Photolithography Processes with Photosensitive Resins for Semi-conductor Technologies with patterns smaller than 90 nm : physical chemical mechanisms inducing the pattern roughness
Olivier Soppera
,
B. Mortini
,
J.P. Gouy
,
C. Braut
,
Georges Hadziioanou
Journées J3N PNANO, Sep 2007, PARIS, France
Conference papers
hal-00199229v1
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Plasmon-triggered living photopolymerization for elaboration of hybrid polymer/metal nanoparticles
Farid Kameche
,
Wajdi Heni
,
Siham Telitel
,
Dandan Ge
,
Loïc Vidal
,
et al.
Journal articles
cea-02874092v1
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Hyperbranched Polymers for Photolithographic Applications - Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances
Christos L. Chochos
,
Esma Ismailova
,
Cyril Brochon
,
Nicolas Leclerc
,
Raluca Tiron
,
et al.
Journal articles
hal-00945178v1
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Multi-Shaped Nanoparticles Utilized as Sources of Surface Plasmon for Nanophotopolymerization
Xuan Zhou
,
Claire Deeb
,
Davy Gérard
,
Alexandre Bouhelier
,
Prashant Jain
,
et al.
GDR ondes: Journée GT2-Micro, nano-structures et dispositifs de l'optique aux micro-ondes, Feb 2012, Dijon, France
Conference papers
hal-02498876v1
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Hybrid plasmonic nano-emitters with controlled single quantum emitter positioning on the local excitation field
Dandan Ge
,
Sylvie Marguet
,
Ali Issa
,
Safi Jradi
,
Tien Hoa Nguyen
,
et al.
Journal articles
hal-02947022v1
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