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authIdHal_s : marc-zelsmann

Polymer photonic band-gaps fabricated by nanoimprint lithography

V. Reboud , T. Kehoe , J. Romero Vivas , N. Kehagias , M. Zelsmann , et al.
Photonics and Nanostructures - Fundamentals and Applications, 2012, vol. 10, p. 632
Journal articles hal-00808929v1

Large-scale processing and graphoepitaxy of PS-b-PDMS

M. Salaun , S. Vayssières , S. Archambault , M. Zelsmann
Workshop on Patterning by Self Assembly and Advanced Self Assembled materials for CMOS applications, Oct 2012, Intel Ireland, Leixlip, Ireland
Conference papers hal-00808933v1

Erbium doped photonic crystal micro-cavity for light extraction enhancement at 300K

A. Salomon , V. Calvo , M. Zelsmann , T. Charvolin , J.-M. Fedeli , et al.
IEEE Journal of Selected Topics in Quantum Electronics, 2006, vol.12, pp.1592
Journal articles hal-00390536v1

Comparison of monomer and polymer resists in thermal nanoimprint lithography

M. Zelsmann , C. Gourgon , J. Boussey-Said
Electron, Ion, Photon Beam Technology and Nanofabrication, 2008, portland, United States
Conference papers hal-00387423v1

On the degradation of anti-sticking layers during nanoimprint lithography

R. Galand , D. Boutry , A. Beaurain , A. Francone , B. Pelissier , et al.
International Conference on Nanoimprint and Nanoprint technology NNT08, 2008, kyoto, Japan
Conference papers hal-00387429v1

Nanoimprint lithography for three-dimensional nanopatterning

N. Kehagias , V. Reboud , G. Chansin , M. Zelsmann , C. Jeppesen , et al.
Micro- and Nano-Engineering conference- MNE 2007, 2007, copenhague, Denmark
Conference papers hal-00396809v1

Modification of spontaneous emission of (CdSe)ZnS nanocrystals embedded in nanoimprinted photonic crystals

N. Kehagias , V. Reboud , M. Zelsmann , M. Striccoli , M. Tamborra , et al.
Journal of Nanoscience and Nanotechnology, 2008, pp.8, 2 (2008) 535-539
Journal articles hal-00394502v1

Stamp replication for thermal and UV nanoimprint lithography using a UV sensitive silsesquioxane resist

N. Kehagias , V. Reboud , J. de Girolamo , M. Chouiki , M. Zelsmann , et al.
Microelectronic Engineering, 2009, pp.86, 4-6 (2009) 776-778
Journal articles hal-00394507v1

Enhancement of light extraction using a nanoimprinted photonic crystal with colloidal nanocrystals

N. Kehagias , V. Reboud , M. Zelsmann , M. Tamborra , M. Striccoli , et al.
International Workshop on Nanostructured Materials - NANOMAT 2006, 2006, antalya, Turkey
Conference papers hal-00394522v1

Spontaneous emission of nanocrystals in nanoimprinted photonic structures

V. Reboud , N. Kehagias , M. Zelsmann , M. Striccoli , M. Tamborra , et al.
Micro- and Nano-Engineering conference- MNE 2006, Sep 2006, barcelone, Spain
Conference papers hal-00394523v1

2D and 3D polymer photonic devices fabricated by nanoimprint lithography

N. Kehagias , V. Reboud , M. Zelsmann , M. Striccoli , M. Tamborra , et al.
Nanosciences & Nanotechnologies conference - NN 08, 2008, thessaloniki, Greece
Conference papers hal-00394540v1

Fabrication of nanoimprinted functionnalized photonic crystals

V. Reboud , N. Kehagias , M. Striccoli , T. Placido , A. Panniello , et al.
Journées Nationales sur les Technologies Emergentes en micro-nanofabrication - JNTE 08, Nov 2008, toulouse, France
Conference papers hal-00394544v1

High-resolution fused silica mold fabrication for UV-nanoimprint

P. Voisin , M. Zelsmann , C. Gourgon , J. Boussey-Said
Micro- and Nano-Engineering conference- MNE 2006, 2006, barcelone, Spain
Conference papers hal-00394551v1

High sensitive and etch-resistant material for UV-nanoimprint

P. Voisin , M. Zelsmann , R. Cluzel , E. Pargon , C. Gourgon , et al.
Micro- and Nano-Engineering conference- MNE 2006, 2006, barcelone, Spain
Conference papers hal-00394552v1

Diffractive optical element for sensor applications, fabricated by reverse contact UV Nanoimprint Lithography

N. Kehagias , G. Chansin , V. Reboud , T. Kehoe , M. Zelsmann , et al.
Nanoimprint and Nanoprint Technology conference - NNT 2006, Nov 2006, san francisco, United States
Conference papers hal-00394555v1

Low-k epoxy silsesquioxane resists for UV nanoimprint lithography

M. Chouiki , H. Ridaoui , M. Zelsmann , J. Boussey-Said , J. de Girolamo
Nanoimprint and Nanoprint Technology conference- NNT 2007, 2007, paris, France
Conference papers hal-00394560v1

Double-anchoring fluorinated molecules for anti-adhesion mold treatment in UV nanoimprint lithography

A. Francone , D. Boutry , A. Beaurain , B. Pelissier , J. Boussey-Said , et al.
Electron, Ion, and Photon Beam technology and Nanofabrication conference - EIPBN 2009, 2009, miami, United States
Conference papers hal-00394574v1

High resolution UV-Nanoimprinting using thin hard quartz moulds

P. Voisin , M. Zelsmann , C. Gourgon , J. Boussey-Said , G. Cunge
Electron, Ion, and Photon Beam technology and Nanofabrication conference - EIPBN 2006-, May 2006, Baltimore, United States
Conference papers hal-00390367v1

Improved release strategy for UV nanoimprint lithography

S. Garidel , M. Zelsmann , N. Chaix , P. Voisin , J. Boussey-Said , et al.
Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), May 2007, Denver, United States
Conference papers hal-00390377v1

Epoxy silsesquioxane resists for UV nanoimprint lithography

J. de Girolamo , M. Chouiki , J.H. Tortai , C. Sourd , S. Derrough , et al.
Journal of Vacuum Science and Technology, 2008, pp.B 26 2271 (2008)
Journal articles hal-00387253v1

Template flatness issue for UV curing Nanoimprint Lithography

P. Voisin , A. Jouve , M. Zelsmann , C. Gourgon , J. Boussey-Said
SPIE (2007), 2007, United States. pp.65172D
Conference papers hal-00387273v1

Nanopatterning via Self-Assembly of a Lamellar-Forming Polystyrene-block-Poly(dimethylsiloxane) Diblock Copolymer on Topographical Substrates Fabricated by Nanoimprint Lithography

Dipu Borah , Cian Cummins , Sozaraj Rasappa , Ramsankar Senthamaraikannan , Mathieu Salaün , et al.
Nanomaterials, 2018, 8 (1), pp.32. ⟨10.3390/nano8010032⟩
Journal articles hal-01954872v1

Annealing treatments of cylindrical siloxane-based block copolymers optimized for nanomanufacturing

Sophie Böhme , Javier Arias-Zapata , Jérome Garnier , Cécile Girardot , Antoine Legrain , et al.
Micro and Nano Engineering, 2018, 1, pp.56-62
Journal articles hal-01954875v1

Effective patterning and cleaning of graphene by plasma etching and block copolymer lithography for nanoribbons fabrication

J. Arias-Zapata , D. Ferrah , H. Mehedi , G. Cunge , M. Zelsmann
Journal of Vacuum Science & Technology A, 2018, 36 (5), pp.05G505
Journal articles hal-02364471v1

A route for industry-compatible directed self-assembly of high-chi PS-PDMS block copolymers

S. Böhme , C. Girardot , J. Garnier , J. Arias-Zapata , S. Arnaud , et al.
SPIE Advanced Lithography conference – Alternative Lithographic Technologies, Feb 2016, San Jose, United States
Conference poster hal-01882740v1
Image document

High flowability monomer resists for thermal nanoimprint lithography

K. Perez Toralla , J. de Girolamo , D. Truffier-Boutry , C. Gourgon , M. Zelsmann
Microelectronic Engineering, 2009, 86 (4-6), pp.779-782. ⟨10.1016/j.mee.2009.01.014⟩
Journal articles hal-00394506v1

PS-b-PDMS graphoepitaxy in trilayer 193 nm photolithography patterns and transfer etching

S. Archambault , M. Salaün , C. Girardot , M. Delalande , G. Cunge , et al.
Micro- and Nano-Engineering conference- MNE 2013, Sep 2013, Londres, United Kingdom
Conference papers hal-00946840v1

Direct patterning and ordering of diblock copolymers through nanoimprint lithography

M. Salaün , N. Kehagias , M. Le Gallic , C.M Sotomayor Torres , M. Zelsmann
Micro- and Nano-Engineering conference- MNE 2011, Sep 2011, Berlin, Germany
Conference papers hal-00634124v1

Multi-functionalized polyhedral oligomeric silsesquioxane (POSS): promising materials for surface chemistry

O. Lorret , J. Kastner , B. Dittert , M. Salaun , M. Zelsmann , et al.
Third International Conference on Multifunctional, Hybrid and Nanomaterials - Hybrid Materials 2013, Mar 2013, Sorrento, Italy
Conference papers hal-00860948v1
Image document

Multifunctional Top-Coats Strategy for DSA of High-χ Block Copolymers

Xavier Chevalier , Cindy Gomes Correia , Gwenaelle Pound-Lana , Philippe Bézard , Matthieu Sérégé , et al.
Journal of Photopolymer Science and Technology, 2021, 34 (1), pp.11-16. ⟨10.2494/photopolymer.34.11⟩
Journal articles hal-03448382v1