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Polymer photonic band-gaps fabricated by nanoimprint lithographyPhotonics and Nanostructures - Fundamentals and Applications, 2012, vol. 10, p. 632
Journal articles
hal-00808929v1
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Large-scale processing and graphoepitaxy of PS-b-PDMSWorkshop on Patterning by Self Assembly and Advanced Self Assembled materials for CMOS applications, Oct 2012, Intel Ireland, Leixlip, Ireland
Conference papers
hal-00808933v1
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Erbium doped photonic crystal micro-cavity for light extraction enhancement at 300KIEEE Journal of Selected Topics in Quantum Electronics, 2006, vol.12, pp.1592
Journal articles
hal-00390536v1
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Comparison of monomer and polymer resists in thermal nanoimprint lithographyElectron, Ion, Photon Beam Technology and Nanofabrication, 2008, portland, United States
Conference papers
hal-00387423v1
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On the degradation of anti-sticking layers during nanoimprint lithographyInternational Conference on Nanoimprint and Nanoprint technology NNT08, 2008, kyoto, Japan
Conference papers
hal-00387429v1
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Nanoimprint lithography for three-dimensional nanopatterningMicro- and Nano-Engineering conference- MNE 2007, 2007, copenhague, Denmark
Conference papers
hal-00396809v1
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Modification of spontaneous emission of (CdSe)ZnS nanocrystals embedded in nanoimprinted photonic crystalsJournal of Nanoscience and Nanotechnology, 2008, pp.8, 2 (2008) 535-539
Journal articles
hal-00394502v1
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Stamp replication for thermal and UV nanoimprint lithography using a UV sensitive silsesquioxane resistMicroelectronic Engineering, 2009, pp.86, 4-6 (2009) 776-778
Journal articles
hal-00394507v1
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Enhancement of light extraction using a nanoimprinted photonic crystal with colloidal nanocrystalsInternational Workshop on Nanostructured Materials - NANOMAT 2006, 2006, antalya, Turkey
Conference papers
hal-00394522v1
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Spontaneous emission of nanocrystals in nanoimprinted photonic structuresMicro- and Nano-Engineering conference- MNE 2006, Sep 2006, barcelone, Spain
Conference papers
hal-00394523v1
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2D and 3D polymer photonic devices fabricated by nanoimprint lithographyNanosciences & Nanotechnologies conference - NN 08, 2008, thessaloniki, Greece
Conference papers
hal-00394540v1
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Fabrication of nanoimprinted functionnalized photonic crystalsJournées Nationales sur les Technologies Emergentes en micro-nanofabrication - JNTE 08, Nov 2008, toulouse, France
Conference papers
hal-00394544v1
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High-resolution fused silica mold fabrication for UV-nanoimprintMicro- and Nano-Engineering conference- MNE 2006, 2006, barcelone, Spain
Conference papers
hal-00394551v1
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High sensitive and etch-resistant material for UV-nanoimprintMicro- and Nano-Engineering conference- MNE 2006, 2006, barcelone, Spain
Conference papers
hal-00394552v1
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Diffractive optical element for sensor applications, fabricated by reverse contact UV Nanoimprint LithographyNanoimprint and Nanoprint Technology conference - NNT 2006, Nov 2006, san francisco, United States
Conference papers
hal-00394555v1
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Low-k epoxy silsesquioxane resists for UV nanoimprint lithographyNanoimprint and Nanoprint Technology conference- NNT 2007, 2007, paris, France
Conference papers
hal-00394560v1
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Double-anchoring fluorinated molecules for anti-adhesion mold treatment in UV nanoimprint lithographyElectron, Ion, and Photon Beam technology and Nanofabrication conference - EIPBN 2009, 2009, miami, United States
Conference papers
hal-00394574v1
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High resolution UV-Nanoimprinting using thin hard quartz mouldsElectron, Ion, and Photon Beam technology and Nanofabrication conference - EIPBN 2006-, May 2006, Baltimore, United States
Conference papers
hal-00390367v1
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Improved release strategy for UV nanoimprint lithographyConference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), May 2007, Denver, United States
Conference papers
hal-00390377v1
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Epoxy silsesquioxane resists for UV nanoimprint lithographyJournal of Vacuum Science and Technology, 2008, pp.B 26 2271 (2008)
Journal articles
hal-00387253v1
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Template flatness issue for UV curing Nanoimprint LithographySPIE (2007), 2007, United States. pp.65172D
Conference papers
hal-00387273v1
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Nanopatterning via Self-Assembly of a Lamellar-Forming Polystyrene-block-Poly(dimethylsiloxane) Diblock Copolymer on Topographical Substrates Fabricated by Nanoimprint LithographyNanomaterials, 2018, 8 (1), pp.32. ⟨10.3390/nano8010032⟩
Journal articles
hal-01954872v1
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Annealing treatments of cylindrical siloxane-based block copolymers optimized for nanomanufacturingMicro and Nano Engineering, 2018, 1, pp.56-62
Journal articles
hal-01954875v1
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Effective patterning and cleaning of graphene by plasma etching and block copolymer lithography for nanoribbons fabricationJournal of Vacuum Science & Technology A, 2018, 36 (5), pp.05G505
Journal articles
hal-02364471v1
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A route for industry-compatible directed self-assembly of high-chi PS-PDMS block copolymersSPIE Advanced Lithography conference – Alternative Lithographic Technologies, Feb 2016, San Jose, United States
Conference poster
hal-01882740v1
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High flowability monomer resists for thermal nanoimprint lithographyMicroelectronic Engineering, 2009, 86 (4-6), pp.779-782. ⟨10.1016/j.mee.2009.01.014⟩
Journal articles
hal-00394506v1
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PS-b-PDMS graphoepitaxy in trilayer 193 nm photolithography patterns and transfer etchingMicro- and Nano-Engineering conference- MNE 2013, Sep 2013, Londres, United Kingdom
Conference papers
hal-00946840v1
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Direct patterning and ordering of diblock copolymers through nanoimprint lithographyMicro- and Nano-Engineering conference- MNE 2011, Sep 2011, Berlin, Germany
Conference papers
hal-00634124v1
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Multi-functionalized polyhedral oligomeric silsesquioxane (POSS): promising materials for surface chemistryThird International Conference on Multifunctional, Hybrid and Nanomaterials - Hybrid Materials 2013, Mar 2013, Sorrento, Italy
Conference papers
hal-00860948v1
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Multifunctional Top-Coats Strategy for DSA of High-χ Block CopolymersJournal of Photopolymer Science and Technology, 2021, 34 (1), pp.11-16. ⟨10.2494/photopolymer.34.11⟩
Journal articles
hal-03448382v1
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