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Effective work function engineering by sacrificial lanthanum diffusion on HfON-based 14 nm NFET devices2015 ESSDERC - 45th European Solid-State Device Research Conference, Sep 2015, Graz, Austria. pp.246-249, ⟨10.1109/ESSDERC.2015.7324760⟩
Conference papers
hal-02049792v1
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Croissance de diélectrique à forte permittivité par la technique MOCVD en phase liquide pulsée : Elaboration, et caractérisation de films de HfO2.Micro et nanotechnologies/Microélectronique. Université Joseph-Fourier - Grenoble I, 2006. Français. ⟨NNT : ⟩
Theses
tel-00130390v1
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Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAMMaterials Science in Semiconductor Processing, 2017, 71, pp.433 - 440. ⟨10.1016/j.mssp.2017.08.033⟩
Journal articles
cea-01586412v1
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