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Understanding of a new approach for silicon nitride spacer etching using gaseous hydrofluoric acid after hydrogen ion implantation

Vincent Ah-Leung , Olivier Pollet , Nicolas Posseme , Maxime Garcia Barros , Névine Rochat , et al.
Journal of Vacuum Science & Technology A, 2017, 35 (2), pp.021408. ⟨10.1116/1.4977077⟩
Journal articles cea-02202455v1