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Water Soluble Resist for Deep-UV (193 nm) Lithography based on a Chitosan Biopolymer

Olha Sysova , Paule Durin , CORINNE GABLIN , Didier Léonard , Alexandre Téolis , et al.
JNTE, Nov 2022, Besancon, France, France
Conference papers hal-04151134v1

How chitosan can be considered as a promising eco-efficient candidate to replace commercial organic-based resists in the photolithography process. Focus on photopatterning and etching behavior in fluorinated plasmas

Didier Léonard , Paule Durin , Olha Sysova , Yue Guan , CORINNE GABLIN , et al.
Thermec, Jul 2023, Vienne, Austria
Conference papers hal-04151212v1

Water-soluble bio-sourced resists for DUVlithography in a 200/300mm pilot line environment Oral Presentation

Isabelle Servin , Alexandre Teolis , Arnaud Bazin , Paule Durin , Olha Sysova , et al.
ICPST, May 2022, Virtual, France
Conference papers hal-04151042v1

Progress and process improvements for multiple electron-beam direct write

Isabelle Servin , Marie-Line Pourteau , Jonathan Pradelles , Philippe Essomba , Ludovic Lattard , et al.
Japanese Journal of Applied Physics, 2017, 56 (6), ⟨10.7567/JJAP.56.06GC03⟩
Journal articles cea-02202410v1

Interactions of water soluble Bio-sourced Resist with Fluorine Etching Plasmas during Photopatterning Processes

Paule Durin , CORINNE GABLIN , Aziz Benamrouche , Samar Hajjar-Garreau , Alexandre Teolis , et al.
JNTE, Nov 2022, Besançon, France, France
Conference poster hal-04151194v1