Filter your results
- 5
- 3
- 1
- 1
- 5
- 3
- 1
- 3
- 1
- 5
- 5
- 4
- 4
- 4
- 4
- 5
- 4
- 4
- 4
- 4
- 4
- 4
- 4
- 4
- 4
- 3
- 3
- 2
- 2
- 2
- 2
- 2
- 2
- 2
- 1
- 1
- 1
- 1
- 1
- 1
- 1
- 1
|
|
sorted by
|
Water Soluble Resist for Deep-UV (193 nm) Lithography based on a Chitosan BiopolymerJNTE, Nov 2022, Besancon, France, France
Conference papers
hal-04151134v1
|
|||
How chitosan can be considered as a promising eco-efficient candidate to replace commercial organic-based resists in the photolithography process. Focus on photopatterning and etching behavior in fluorinated plasmasThermec, Jul 2023, Vienne, Austria
Conference papers
hal-04151212v1
|
|||
Water-soluble bio-sourced resists for DUVlithography in a 200/300mm pilot line environment Oral PresentationICPST, May 2022, Virtual, France
Conference papers
hal-04151042v1
|
|||
Progress and process improvements for multiple electron-beam direct writeJapanese Journal of Applied Physics, 2017, 56 (6), ⟨10.7567/JJAP.56.06GC03⟩
Journal articles
cea-02202410v1
|
|||
Interactions of water soluble Bio-sourced Resist with Fluorine Etching Plasmas during Photopatterning ProcessesJNTE, Nov 2022, Besançon, France, France
Conference poster
hal-04151194v1
|