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A benchmark of co-flow and cyclic deposition/etch approaches for the selective epitaxial growth of tensile-strained SiP
J. M. Hartmann
,
M. Veillerot
,
B. Previtali
Journal articles
cea-02202443v1
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Advances in top-down fabrication and processing of vertical SiGe nanowire arrays for future nanoelectronics applications
Jonas Müller
,
Aurélie Lecestre
,
Rémi Demoulin
,
Fuccio Cristiano
,
J. M. Hartmann
,
et al.
J2N 2022 - Journées Nationales Nanofils semiconducteurs, Sep 2022, Nice, France
Conference papers
hal-03771519v1
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Assessment of the growth/etch back technique for the production of Ge strain-relaxed buffers on Si
J. M. Hartmann
,
J. Aubin
Journal articles
cea-02186240v1
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Atmospheric Pressure Selective Epitaxial Growth of Heavily In Situ Phosphorous-Doped Si(C) Raised Sources and Drains
J. M. Hartmann
,
J. Aubin
,
S. Barraud
,
M. P. Samson
Journal articles
cea-02202448v1
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Top-Down Fabrication of Vertical Nanostructured Channel Arrays on SiGe for Future Nanoelectronics Applications
Jonas Müller
,
Aurélie Lecestre
,
Rémi Demoulin
,
Fuccio Cristiano
,
J. M. Hartmann
,
et al.
MNE Eurosensors 2022, Sep 2022, Leuven, Belgium. 2022
Conference poster
hal-03771503v1
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Mid-infrared supercontinuum generation in a varying dispersion waveguide for multi-species gas spectroscopy
Alberto Della Torre
,
Remi Armand
,
Milan Sinobad
,
Kokou Firmin Fiaboe
,
Barry Luther-Davies
,
et al.
Journal articles
hal-03998322v1
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