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Precise control of template affinity achieved by UV-assisted graphoepitaxy approach on silicon nanowires applicationsNovel Patterning Technologies 2018, Feb 2018, San Jose, Canada. pp.11, ⟨10.1117/12.2297407⟩
Conference papers
cea-02185301v1
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Balancing Block Copolymer Thickness over Template Density in Graphoepitaxy ApproachMacromolecular Materials and Engineering, 2017, 302 (11), pp.1700285. ⟨10.1002/mame.201700285⟩
Journal articles
cea-02111234v1
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New CH 4 -N 2 dry etch chemistry for poly(methyl methacrylate) removal without consuming polystyrene for lamellar copolymers applicationJournal of Vacuum Science & Technology B, Nanotechnology and Microelectronics, 2019, 37 (3), pp.030601. ⟨10.1116/1.5090395⟩
Journal articles
hal-02387281v1
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