Search - CEA - Commissariat à l’énergie atomique et aux énergies alternatives Access content directly

Filter your results

7 Results
authFullName_s : Sebastien Barnola

Cleaning chamber walls after ITO plasma etching process

Salma Younesy , Camille Petit-Etienne , Sebastien Barnola , Pascal Gouraud , Gilles Cunge
Advanced Etch Technology for Nanopatterning IX, Feb 2020, San Jose, United States. pp.30, ⟨10.1117/12.2549210⟩
Conference papers hal-02912746v1

Understanding of a new approach for silicon nitride spacer etching using gaseous hydrofluoric acid after hydrogen ion implantation

Vincent Ah-Leung , Olivier Pollet , Nicolas Posseme , Maxime Garcia Barros , Névine Rochat , et al.
Journal of Vacuum Science & Technology A, 2017, 35 (2), pp.021408. ⟨10.1116/1.4977077⟩
Journal articles cea-02202455v1

Porous SiOCH integration: Etch challenges with a trench first metal hard mask approach

Nicolas Possémé , Thibaut David , Thierry Chevolleau , Maxime Darnon , Philippe Brun , et al.
Chinese Semiconductor Technology International Conference (CSTIC), Mar 2011, Shanghaï, China. pp.389-394, ⟨10.1149/1.3567609⟩
Conference papers hal-00625347v1

Patterning Challenges in Microelectronics

Sebastien Barnola , Nicolas Posseme , Stefan Landis , Maxime Darnon
Plasma Etching Processes for CMOS Devices Realization, Elsevier, pp.59-94, 2017, ⟨10.1016/B978-1-78548-096-6.50003-1⟩
Book sections hal-02338425v1

New CH 4 -N 2 dry etch chemistry for poly(methyl methacrylate) removal without consuming polystyrene for lamellar copolymers application

Aurélien Sarrazin , Nicolas Posseme , Patricia Pimenta-Barros , Sebastien Barnola , Raluca Tiron , et al.
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics, 2019, 37 (3), pp.030601. ⟨10.1116/1.5090395⟩
Journal articles hal-02387281v1

Gate patterning strategies to reduce the gate shifting phenomenon for 14 nm fully depleted silicon-on-insulator technology

Onintza Ros , Erwine Pargon , Marc Fouchier , Pascal Gouraud , Sebastien Barnola
Journal of Vacuum Science & Technology A, 2017, 35 (2), ⟨10.1116/1.4972228⟩
Journal articles hal-01891224v1
Image document

Block copolymer selectivity: A new dry etch approach for cylindrical applications

Aurélien Sarrazin , Nicolas Posseme , Patricia Pimenta-Barros , Sebastien Barnola , Ahmed Gharbi , et al.
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, 2018, 36 (4), ⟨10.1116/1.5034133⟩
Journal articles hal-01860237v1