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Cleaning chamber walls after ITO plasma etching process
Salma Younesy
,
Camille Petit-Etienne
,
Sebastien Barnola
,
Pascal Gouraud
,
Gilles Cunge
Advanced Etch Technology for Nanopatterning IX, Feb 2020, San Jose, United States. pp.30, ⟨10.1117/12.2549210⟩
Conference papers
hal-02912746v1
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Understanding of a new approach for silicon nitride spacer etching using gaseous hydrofluoric acid after hydrogen ion implantation
Vincent Ah-Leung
,
Olivier Pollet
,
Nicolas Posseme
,
Maxime Garcia Barros
,
Névine Rochat
,
et al.
Journal articles
cea-02202455v1
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Porous SiOCH integration: Etch challenges with a trench first metal hard mask approach
Nicolas Possémé
,
Thibaut David
,
Thierry Chevolleau
,
Maxime Darnon
,
Philippe Brun
,
et al.
Chinese Semiconductor Technology International Conference (CSTIC), Mar 2011, Shanghaï, China. pp.389-394, ⟨10.1149/1.3567609⟩
Conference papers
hal-00625347v1
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Patterning Challenges in Microelectronics
Sebastien Barnola
,
Nicolas Posseme
,
Stefan Landis
,
Maxime Darnon
Book sections
hal-02338425v1
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New CH 4 -N 2 dry etch chemistry for poly(methyl methacrylate) removal without consuming polystyrene for lamellar copolymers application
Aurélien Sarrazin
,
Nicolas Posseme
,
Patricia Pimenta-Barros
,
Sebastien Barnola
,
Raluca Tiron
,
et al.
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics, 2019, 37 (3), pp.030601. ⟨10.1116/1.5090395⟩
Journal articles
hal-02387281v1
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Gate patterning strategies to reduce the gate shifting phenomenon for 14 nm fully depleted silicon-on-insulator technology
Onintza Ros
,
Erwine Pargon
,
Marc Fouchier
,
Pascal Gouraud
,
Sebastien Barnola
Journal articles
hal-01891224v1
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Block copolymer selectivity: A new dry etch approach for cylindrical applications
Aurélien Sarrazin
,
Nicolas Posseme
,
Patricia Pimenta-Barros
,
Sebastien Barnola
,
Ahmed Gharbi
,
et al.
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, 2018, 36 (4), ⟨10.1116/1.5034133⟩
Journal articles
hal-01860237v1
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