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authFullName_s : S. Arnaud

A route for industry-compatible directed self-assembly of high-chi PS-PDMS block copolymers

S. Böhme , C. Girardot , J. Garnier , J. Arias-Zapata , S. Arnaud , et al.
SPIE Advanced Lithography conference – Alternative Lithographic Technologies, Feb 2016, San Jose, United States
Conference poster hal-01882740v1

Development of plasma etching processes for the integration of III-V semicondutors as trigate nMOSFET’s channels

M. Bizouerne , E. Pargon , P. Burtin , C. Petit-Etienne , E. Latu-Romain , et al.
Plasma Etch and Strip in Microelectronics (PESM), 9th International Workshop, May 2016, Grenoble, France
Conference papers hal-01882457v1

Chlorine-based etching of InP laser : effect of plasma chemistry on sidewall roughness and damages

G. Gay , E. Pargon , C. Petit-Etienne , M. Brihoum , S. Barnola , et al.
65th International AVS Symposium & Topical Conferences, Nov 2016, Nashville, USA, United States
Conference papers hal-01882766v1

Spatially correlated structural and optical characterization of a single InGaAs quantum well fin selectively grown on Si by microscopy and cathodoluminescence techniques

S. David , J. Roque , N. Rochat , N. Bernier , L. Piot , et al.
APL Materials, 2016, 4 (5), ⟨10.1063/1.4949761⟩
Journal articles hal-01881951v1

Evolutions structurales au sein d'un alliage de zirconium oxyde a haute temperature en diffraction des rayons X in situ au rayonnement synchrotron

R. Guillou , Jl. Bechade , M. Lesaux , R. Guinebretière , Olivier Castelnau , et al.
La metallurgie, quel avenir, Apr 2019, Nancy, France
Conference papers hal-02411055v1

Plasma etching optimization and alignment control of directed self-assembled high-Χ cylindrical PS-PDMS

S. Böhme , J. Garnier , C. Girardot , J. Arias-Zapata , S. Arnaud , et al.
European Materials Research Society conference- E-MRS 2015, Spring Meeting, May 2015, Lille, France
Conference papers hal-01877841v1

DSA pattern transfer with PS-PMMA and silicon-containing block copolymers

S. Böhme , P. Bézard , C. Girardot , J. Garnier , J. Arias-Zapata , et al.
SPIE-Advanced Lithography, San Jose (US), 24-26 October 2016, Oct 2016, San Jose, United States
Conference papers hal-01881984v1

MOCVD Epitaxy and Characterization of III-As and III-P Thin Layers on 300mm Silicon Substrate

Mickael Martin , Romain Cipro , M. Billaud , Jérémy Moeyaert , Franck Bassani , et al.
MRS Spring Meeting, Apr 2015, San Francisco, California, United States. 2015
Conference poster hal-01489617v1

Etude in-situ resolue en temps par diffraction des rayons X sous rayonnement synchrotron des evolutions structurales au sein d'un alliage de zirconium oxyde a haute temperature

R. Guillou , M. Lesaux , Jl. Bechade , R. Guinebretière , Olivier Castelnau , et al.
Materiaux 2018, Nov 2018, Strasbourg, France
Conference papers cea-02400186v1

A route for industry-compatible DSA of high-chi PS-PDMS block copolymers

S. Böhme , C. Girardot , J. Garnier , J. Arias-Zapata , S. Arnaud , et al.
China Semiconductor Technology International Conference – CSTIC 2016, Mar 2016, Shanghai (Chine), China
Conference papers hal-01882495v1

Directed self-assembly process for high-X PS-b-PDMS diblock copolymer compatible with microelectronics environment

J. Garnier , S. Böhme , C. Girardot , S. Arnaud , J. Arias-Zapatta , et al.
European Materials Research Society conference- E-MRS 2015, Spring Meeting, May 2015, Lille, France
Conference papers hal-01877293v1