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Complete data preparation flow for Massively Parallel E-Beam lithography on 28nm node full-field designSPIE Advanced Lithography, 2016, San Jose, United States. pp.977714, ⟨10.1117/12.2219178⟩
Conference papers
hal-02332442v1
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Progress and process improvements for multiple electron-beam direct writeJapanese Journal of Applied Physics, 2017, 56 (6), ⟨10.7567/JJAP.56.06GC03⟩
Journal articles
cea-02202410v1
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