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authFullName_s : Nicolas Posseme

Atomic and Molecular Layer Deposition Area Selective Deposition using alternate deposition and etch super-cycle strategies.

Marceline Bonvalot , Christophe Vallee , Cedric Mannequin , Moustapha Jaffal , Remy Gassilloud , et al.
Dalton Transactions, 2021, ⟨10.1039/D1DT03456A⟩
Journal articles hal-03449134v1
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Gate spacers etching of Si$_3$N$_4$ using cyclic approach for 3D CMOS devices

Valentin Bacquie , Aurelien Tavernier , Francois Boulard , Olivier Pollet , Nicolas Posseme
Journal of Vacuum Science & Technology A, 2021, 39, pp.033005. ⟨10.1116/6.0000871⟩
Journal articles cea-03343549v1

Elaboration Strategies for Topographically Selective Deposition (TSD) on 3D structures

Taguhi Yeghoyan , Moustapha Jaffal , Gauthier Lefèvre , Gassilloud Rémi , Nicolas Posseme , et al.
5th Area Selective Deposition Workshop (ASD 2020), Apr 2020, Palo alto, United States
Conference papers hal-03449258v1

Topographic Area Selective Deposition (TSD): a comparison between PEALD/q-ALE and PEALD/sputtering approaches

Moustapha Jaffal , Taguhi Yeghoyan , Vincent Pesce , Gauthier Lefevre , Ahmad Chaker , et al.
7th International Atomic Layer Etching Workshop (ALE 2020), Jun 2020, virtuelle, France. ⟨10.1116/6.0000969⟩
Conference papers hal-03449336v1

Precise control of template affinity achieved by UV-assisted graphoepitaxy approach on silicon nanowires applications

Patricia Pimenta-Barros , Guillaume Claveau , Maxime Argoud , Zdenek Chalupa , Nacima Allouti , et al.
Novel Patterning Technologies 2018, Feb 2018, San Jose, Canada. pp.11, ⟨10.1117/12.2297407⟩
Conference papers cea-02185301v1

Challenges of contact etching for 14FDSOI technology

Mokrane Mebarki , Maxime Darnon , Cecile Jenny , Nicolas Posseme , Delia Ristoiu , et al.
SPIE-AL, Feb 2015, San Jose, United States
Conference papers hal-02339980v1

Diagnostics in Pulsed Hydrogen Plasmas

Jerome Dubois , Gilles Cunge , Nicolas Posseme , Maxime Darnon , Laurent Vallier , et al.
AVS 61st international symposium, Oct 2014, Baltimore, United States
Conference papers hal-02339983v1

Characterization and Development of High Dose Implanted Resist Stripping Processes

Marion Croisy , Cécile Jenny , Claire Richard , Denis Guiheux , Alain Campo , et al.
Solid State Phenomena, 2016, 255, pp.111 - 116. ⟨10.4028/www.scientific.net/SSP.255.111⟩
Journal articles hal-01882437v1

Diagnostics in pulsed hydrogen plasmas

Jerome Dubois , Gilles Cunge , Maxime Darnon , Nicolas Posseme , Laurent Vallier , et al.
11th Frontiers in low temperature plasma diagnostics, May 2015, Hyeres, France
Conference papers hal-02339976v1

Interconnects for Tomorrow

Maxime Darnon , Nicolas Posseme
Plasma Etching Processes for Interconnect Realization in VLSI, Elsevier, pp.77-91, 2015, ⟨10.1016/B978-1-78548-015-7.50004-4⟩
Book sections hal-02339235v1

Plasma Etch Challenges for Gate Patterning

Maxime Darnon , Nicolas Posseme
Plasma Etching Processes for CMOS Devices Realization, Elsevier, pp.95-118, 2017, ⟨10.1016/B978-1-78548-096-6.50004-3⟩
Book sections hal-02338426v1

Optimization of a Topographic Selective Deposition (TSD) route by a super-cycle Atomic Layer Disposition (ALD) / Atomic Layer Etching (ALE)

Moustapha Jaffal , Taguhi Yeghoyan , Gauthier Lefevre , Thierry Chevolleau , Rémy Gassilloud , et al.
6 ème Workshop RAFALD 2020, Nov 2020, Marseille, France
Conference papers hal-03449579v1
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Étude de l'intégration des matériaux à très faible permittivité diélectrique dans une structure damascène pour les filières technologiques CMOS

Nicolas Posseme
Micro et nanotechnologies/Microélectronique. Université de Grenoble, 2005. Français. ⟨NNT : ⟩
Theses tel-00685803v1
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Study of porous SiOCH patterning using metallic hard mask: challenges and solutions

Nicolas Posseme , Thibaut David , Thierry Chevolleau , Maxime Darnon , Fanny Bailly , et al.
ECS Transactions, 2011, 35 (4), pp.667-685. ⟨10.1149/1.3572312⟩
Journal articles hal-00629313v1
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PMMA removal selectivity to polystyrene using dry etch approach

Aurélien Sarrazin , Nicolas Posseme , Patricia Pimenta-Barros , Sébastien Barnola , Ahmed Gharbi , et al.
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics, 2016, 34, pp.061802. ⟨10.1116/1.4964881⟩
Journal articles hal-01723375v1
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Dry etching study of 3D Grayscale micrometric patterns into a polymer layer

Assia Selmouni , Aurélien Tavernier , Sébastien Bérard-Bergery , Nicolas Posseme
MNE2022 Eurosensors - PESM Workshop, Micro and Nano Engineering, Sep 2022, Leuven, Belgium
Conference papers cea-03773457v1

Understanding of a new approach for silicon nitride spacer etching using gaseous hydrofluoric acid after hydrogen ion implantation

Vincent Ah-Leung , Olivier Pollet , Nicolas Posseme , Maxime Garcia Barros , Névine Rochat , et al.
Journal of Vacuum Science & Technology A, 2017, 35 (2), pp.021408. ⟨10.1116/1.4977077⟩
Journal articles cea-02202455v1

New insight into vertical topographical selective deposition of tantalum oxide Ta2O5 by morphological analyses

Gauthier Lefevre , Moustapha Jaffal , Taguhi Yeghoyan , Rémy Gassilloud , Nicolas Posseme , et al.
Advanced Nanomaterials Congress 2021, Oct 2021, Stockolm, Sweden
Conference papers hal-03449194v1

Patterning Challenges in Microelectronics

Sebastien Barnola , Nicolas Posseme , Stefan Landis , Maxime Darnon
Plasma Etching Processes for CMOS Devices Realization, Elsevier, pp.59-94, 2017, ⟨10.1016/B978-1-78548-096-6.50003-1⟩
Book sections hal-02338425v1

Plasma Damage of Porous Low-k Materials

Maxime Darnon , Thierry Chevolleau , Romain Hurand , David Fuard , Régis Bouyssou , et al.
Material Research Society Spring Meeting, Apr 2014, San Francisco, United States
Conference papers hal-02338124v1

Prospects for dielectric constant reduction in integrated circuits interconnects

Maxime Darnon , Nicolas Posseme , Thierry Chevolleau , Thibaut David
Materials Research Society Spring Meeting, Jun 2014, San Francisco, United States. pp.Mrss14-1692-cc01-01, ⟨10.1557/opl.2014.609⟩
Conference papers hal-02338418v1

New CH 4 -N 2 dry etch chemistry for poly(methyl methacrylate) removal without consuming polystyrene for lamellar copolymers application

Aurélien Sarrazin , Nicolas Posseme , Patricia Pimenta-Barros , Sebastien Barnola , Raluca Tiron , et al.
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics, 2019, 37 (3), pp.030601. ⟨10.1116/1.5090395⟩
Journal articles hal-02387281v1

Challenges related to linewidth roughness

Erwine Pargon , Laurent Azarnouch , Kevin Menguelti , Marc Fouchier , Melisa Brihoum , et al.
China Semiconductor Technology International Conference (CSTIC), Mar 2012, Shanghai, China
Conference papers hal-02338405v1
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Role of SiCl$_4$ addition in CH$_3$F/O$_2$ based chemistry for Si$_3$N$_4$ etching selectively to SiO$_2$, SiCO and Si

Francois Boulard , Valentin Bacquie , Aurelien Tavernier , Nicolas Posseme
Journal of Vacuum Science & Technology A, 2023, 41 (3), pp.033002. ⟨10.1116/6.0002434⟩
Journal articles cea-04170423v1

Topographic Selective Deposition (TSD) by Combining Plasma Enhanced Atomic Layer Deposition and Atomic Layer Etching Processes

Moustapha Jaffal , Gauthier Lefevre , Taguhi Yeghoyan , Thierry Chevolleau , Rémy Gassilloud , et al.
ALD/ALE 2021 Virtual Meeting Overview - ALD 2021 – AVS, 2021, Virtual Meeting, France
Conference papers hal-03449379v1

Characterization of photoresist films exposed to high-dose implantation conditions

Marion Croisy , Erwine Pargon , Cécile Jenny , Claire Richard , Denis Guiheux , et al.
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics, 2018, 36 (1), pp.011201
Journal articles hal-01942735v1
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Thin layer etching of low-k SiCO spacer using hydrogen ion implantation followed by hydrofluoric acid

Nicolas Posseme , Maxime Garcia-Barros , François Leverd , Daniel Benoit , Olivier Pollet , et al.
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, 2018, 36 (5), pp.052201. ⟨10.1116/1.5038617⟩
Journal articles cea-02185184v1
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Plasma deposition—Impact of ions in plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, and applications to area selective deposition

Christophe Vallee , Marceline Bonvalot , Samia Belahcen , Taguhi Yeghoyan , Moustapha Jaffal , et al.
Journal of Vacuum Science & Technology A, 2020, 38 (3), pp.033007. ⟨10.1116/1.5140841⟩
Journal articles hal-02586207v1
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Block copolymer selectivity: A new dry etch approach for cylindrical applications

Aurélien Sarrazin , Nicolas Posseme , Patricia Pimenta-Barros , Sebastien Barnola , Ahmed Gharbi , et al.
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, 2018, 36 (4), ⟨10.1116/1.5034133⟩
Journal articles hal-01860237v1

Diagnostics of Pulsed Hydrogen Plasmas

Jerome Dubois , Gilles Cunge , Olivier Joubert , Maxime Darnon , Laurent Vallier , et al.
67th Gaseous Electronic Conference, Oct 2014, Raleigh, United States
Conference papers hal-02339984v1