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authFullName_s : Nacima Allouti
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Die-to-die alignment for lithographic processing of reconstructed wafers

Mikhail Loktev , Sylvain Misat , Ralph Schiedon , Jeroen de Boeij , Michiel van der Stam , et al.
2022 Smart Systems Integration (SSI), IEEE, Apr 2022, Grenoble, France. ⟨10.1109/SSI56489.2022.9901421⟩
Conference papers cea-03956462v1

Precise control of template affinity achieved by UV-assisted graphoepitaxy approach on silicon nanowires applications

Patricia Pimenta-Barros , Guillaume Claveau , Maxime Argoud , Zdenek Chalupa , Nacima Allouti , et al.
Novel Patterning Technologies 2018, Feb 2018, San Jose, Canada. pp.11, ⟨10.1117/12.2297407⟩
Conference papers cea-02185301v1