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Die-to-die alignment for lithographic processing of reconstructed wafers2022 Smart Systems Integration (SSI), IEEE, Apr 2022, Grenoble, France. ⟨10.1109/SSI56489.2022.9901421⟩
Conference papers
cea-03956462v1
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Precise control of template affinity achieved by UV-assisted graphoepitaxy approach on silicon nanowires applicationsNovel Patterning Technologies 2018, Feb 2018, San Jose, Canada. pp.11, ⟨10.1117/12.2297407⟩
Conference papers
cea-02185301v1
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