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Mécanismes de collage et de transfert de films monocristallins dans des structures à couches de polymères
Maxime Argoud
Theses
tel-00848111v1
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PMMA removal selectivity to polystyrene using dry etch approach
Aurélien Sarrazin
,
Nicolas Posseme
,
Patricia Pimenta-Barros
,
Sébastien Barnola
,
Ahmed Gharbi
,
et al.
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics, 2016, 34, pp.061802. ⟨10.1116/1.4964881⟩
Journal articles
hal-01723375v1
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Contact hole shrink by directed self-assembly: Process integration and stability monitored on 300 mm pilot line
Isabelle Servin
,
Raluca Tiron
,
Ahmed Gharbi
,
Maxime Argoud
,
Karine Jullian
,
et al.
Journal articles
hal-01798622v1
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Precise control of template affinity achieved by UV-assisted graphoepitaxy approach on silicon nanowires applications
Patricia Pimenta-Barros
,
Guillaume Claveau
,
Maxime Argoud
,
Zdenek Chalupa
,
Nacima Allouti
,
et al.
Conference papers
cea-02185301v1
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Block copolymer selectivity: A new dry etch approach for cylindrical applications
Aurélien Sarrazin
,
Nicolas Posseme
,
Patricia Pimenta-Barros
,
Sebastien Barnola
,
Ahmed Gharbi
,
et al.
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, 2018, 36 (4), ⟨10.1116/1.5034133⟩
Journal articles
hal-01860237v1
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Etching of sub-10 nm half-pitch high chi block copolymers for directed self-assembly (DSA) application
Maria Gabriela Gusmão Cacho
,
Patricia Pimenta-Barros
,
Maxime Argoud
,
Christophe Navarro
,
Kaumba Sakavuyi
,
et al.
Journal articles
hal-03490365v1
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Scaling-down lithographic dimensions with block-copolymer materials: 10-nm-sized features with poly(styrene)-block-poly(methylmethacrylate)
Xavier Chevalier
,
Célia Nicolet
,
Raluca Tiron
,
Ahmed Gharbi
,
Maxime Argoud
,
et al.
Journal articles
hal-00926366v1
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