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authFullName_s : Ludovic Lattard

Progress and process improvements for multiple electron-beam direct write

Isabelle Servin , Marie-Line Pourteau , Jonathan Pradelles , Philippe Essomba , Ludovic Lattard , et al.
Japanese Journal of Applied Physics, 2017, 56 (6), ⟨10.7567/JJAP.56.06GC03⟩
Journal articles cea-02202410v1

Complete data preparation flow for Massively Parallel E-Beam lithography on 28nm node full-field design

Aurélien Fay , Clyde Browning , Pieter Brandt , Jacky Chartoire , Sébastien Bérard-Bergery , et al.
SPIE Advanced Lithography, 2016, San Jose, United States. pp.977714, ⟨10.1117/12.2219178⟩
Conference papers hal-02332442v1