Multifunctional Top-Coats Strategy for DSA of High-χ Block Copolymers
Xavier Chevalier
,
Cindy Gomes Correia
,
Gwenaelle Pound-Lana
,
Philippe Bézard
,
Matthieu Sérégé
,
et al.
Journal articles
hal-03448382v1
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Precise control of template affinity achieved by UV-assisted graphoepitaxy approach on silicon nanowires applications
Patricia Pimenta-Barros
,
Guillaume Claveau
,
Maxime Argoud
,
Zdenek Chalupa
,
Nacima Allouti
,
et al.
Conference papers
cea-02185301v1
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Balancing Block Copolymer Thickness over Template Density in Graphoepitaxy Approach
Patricia Pimenta Barros
,
Ahmed Gharbi
,
Antoine Fouquet
,
Sandra Bos
,
Jérôme Hazart
,
et al.
Journal articles
cea-02111234v1
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Lithographically Defined Cross-Linkable Top Coats for Nanomanufacturing with High-χ Block Copolymers
Xavier Chevalier
,
Cindy Gomes Correia
,
Gwenaelle Pound-Lana
,
Philippe Bézard
,
Matthieu Sérégé
,
et al.
Journal articles
hal-03218670v1
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Top-coats for scalable nano-manufacturing with high-χ block copolymers in lithographic applications
Xavier Chevalier
,
Cindy Gomez Correia
,
Gwenaelle Pound-Lana
,
Philippe Bézard
,
Matthieu Sérégé
,
et al.
Advances in Patterning Materials and Processes XXXVIII , Feb 2021, Online Only, France. pp.26,
⟨10.1117/12.2583717⟩
Conference papers
hal-03448358v1
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Pillars fabrication by DSA lithography: material and process options
Ahmed Gharbi
,
Patricia Pimenta-Barros
,
Olivia Saouaf
,
Gabriel Reynaud
,
Laurent Pain
,
et al.
Advances in Patterning Materials and Processes XXXV , Feb 2018, San Jose, United States. pp.105860Q,
⟨10.1117/12.2297414⟩
Conference papers
cea-02087039v1
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Design of new block-copolymer systems to achieve thick-films with defect-free structures for applications of DSA into lithographic large nodes
Xavier Chevalier
,
Paul Coupillaud
,
Geoffrey Lombard
,
Célia Nicolet
,
Julien Beausoleil
,
et al.
ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXIII , 9779, pp.Art. No. 977913, 2016, Book Series: Proceedings of SPIE, ISBN:978-1-5106-0014-0.
⟨10.1117/12.2219214⟩
Book sections
hal-01406087v1
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Top-coats for scalable nano-manufacturing with high-χ block copolymers in lithographic applications
Xavier Chevalier
,
Cindy Gomes Correia
,
Gwenaelle Pound-Lana
,
Philippe Bézard
,
Matthieu Sérégé
,
et al.
SPIE Advanced Lithography conference – Alternative Lithographic Technologies , Feb 2021, San Jose, USA, France. pp.26,
⟨10.1117/12.2583717⟩
Conference papers
hal-03452942v1
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Graphoepitaxy integration and pattern transfer of lamellar silicon-containing high-chi block copolymers
Marc Zelsmann
,
Philippe Bézard
,
Xavier Chevalier
,
Antoine Legrain
,
Christophe Navarro
,
et al.
Conference papers
hal-01954390v1
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