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authFullName_s : Ian Cayrefourcq
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Multifunctional Top-Coats Strategy for DSA of High-χ Block Copolymers

Xavier Chevalier , Cindy Gomes Correia , Gwenaelle Pound-Lana , Philippe Bézard , Matthieu Sérégé , et al.
Journal of Photopolymer Science and Technology, 2021, 34 (1), pp.11-16. ⟨10.2494/photopolymer.34.11⟩
Journal articles hal-03448382v1

Precise control of template affinity achieved by UV-assisted graphoepitaxy approach on silicon nanowires applications

Patricia Pimenta-Barros , Guillaume Claveau , Maxime Argoud , Zdenek Chalupa , Nacima Allouti , et al.
Novel Patterning Technologies 2018, Feb 2018, San Jose, Canada. pp.11, ⟨10.1117/12.2297407⟩
Conference papers cea-02185301v1
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Balancing Block Copolymer Thickness over Template Density in Graphoepitaxy Approach

Patricia Pimenta Barros , Ahmed Gharbi , Antoine Fouquet , Sandra Bos , Jérôme Hazart , et al.
Macromolecular Materials and Engineering, 2017, 302 (11), pp.1700285. ⟨10.1002/mame.201700285⟩
Journal articles cea-02111234v1
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Lithographically Defined Cross-Linkable Top Coats for Nanomanufacturing with High-χ Block Copolymers

Xavier Chevalier , Cindy Gomes Correia , Gwenaelle Pound-Lana , Philippe Bézard , Matthieu Sérégé , et al.
ACS Applied Materials & Interfaces, 2021, 13 (9), pp.11224-11236. ⟨10.1021/acsami.1c00694⟩
Journal articles hal-03218670v1

Top-coats for scalable nano-manufacturing with high-χ block copolymers in lithographic applications

Xavier Chevalier , Cindy Gomez Correia , Gwenaelle Pound-Lana , Philippe Bézard , Matthieu Sérégé , et al.
Advances in Patterning Materials and Processes XXXVIII, Feb 2021, Online Only, France. pp.26, ⟨10.1117/12.2583717⟩
Conference papers hal-03448358v1
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Pillars fabrication by DSA lithography: material and process options

Ahmed Gharbi , Patricia Pimenta-Barros , Olivia Saouaf , Gabriel Reynaud , Laurent Pain , et al.
Advances in Patterning Materials and Processes XXXV, Feb 2018, San Jose, United States. pp.105860Q, ⟨10.1117/12.2297414⟩
Conference papers cea-02087039v1

Design of new block-copolymer systems to achieve thick-films with defect-free structures for applications of DSA into lithographic large nodes

Xavier Chevalier , Paul Coupillaud , Geoffrey Lombard , Célia Nicolet , Julien Beausoleil , et al.
ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXIII, 9779, pp.Art. No. 977913, 2016, Book Series: Proceedings of SPIE, ISBN:978-1-5106-0014-0. ⟨10.1117/12.2219214⟩
Book sections hal-01406087v1
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Top-coats for scalable nano-manufacturing with high-χ block copolymers in lithographic applications

Xavier Chevalier , Cindy Gomes Correia , Gwenaelle Pound-Lana , Philippe Bézard , Matthieu Sérégé , et al.
SPIE Advanced Lithography conference – Alternative Lithographic Technologies, Feb 2021, San Jose, USA, France. pp.26, ⟨10.1117/12.2583717⟩
Conference papers hal-03452942v1

Graphoepitaxy integration and pattern transfer of lamellar silicon-containing high-chi block copolymers

Marc Zelsmann , Philippe Bézard , Xavier Chevalier , Antoine Legrain , Christophe Navarro , et al.
SPIE Advanced Lithography, 2018, San José, United States. ⟨10.1117/12.2299337⟩
Conference papers hal-01954390v1