Filter your results
- 2
- 1
- 1
- 1
- 1
- 1
- 1
- 2
- 2
- 1
- 1
- 2
- 2
- 2
- 2
- 1
- 1
- 1
- 1
- 1
- 1
- 1
- 1
- 1
- 1
- 1
- 1
- 1
- 1
- 1
- 1
- 1
- 1
- 1
- 1
- 1
|
|
sorted by
|
Contact hole shrink by directed self-assembly: Process integration and stability monitored on 300 mm pilot lineJapanese Journal of Applied Physics, 2014, 53 (6S), ⟨10.7567/JJAP.53.06JC05⟩
Journal articles
hal-01798622v1
|
|||
Precise control of template affinity achieved by UV-assisted graphoepitaxy approach on silicon nanowires applicationsNovel Patterning Technologies 2018, Feb 2018, San Jose, Canada. pp.11, ⟨10.1117/12.2297407⟩
Conference papers
cea-02185301v1
|