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Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAMMaterials Science in Semiconductor Processing, 2017, 71, pp.433 - 440. ⟨10.1016/j.mssp.2017.08.033⟩
Journal articles
cea-01586412v1
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Tntegration of CMOS-compatible contacts on III-V materials for photonic devices on silicon using 300 mm platformMicro and nanotechnologies/Microelectronics. Université Grenoble Alpes [2020-..], 2020. English. ⟨NNT : 2020GRALT068⟩
Theses
tel-03206160v1
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