Block copolymer technology applied to nanoelectronics
Salomé Tallegas
,
Thierry Baron
,
Guillaume Gay
,
Claire Aggrafeil
,
Billel Salhi
,
et al.
Journal articles
istex
hal-02114577v1
Actions
Share
Gmail
Facebook
Twitter
LinkedIn
More
Top-coats for scalable nano-manufacturing with high-χ block copolymers in lithographic applications
Xavier Chevalier
,
Cindy Gomez Correia
,
Gwenaelle Pound-Lana
,
Philippe Bézard
,
Matthieu Sérégé
,
et al.
Advances in Patterning Materials and Processes XXXVIII , Feb 2021, Online Only, France. pp.26,
⟨10.1117/12.2583717⟩
Conference papers
hal-03448358v1
Actions
Share
Gmail
Facebook
Twitter
LinkedIn
More
Pattern density multiplication by direct self assembly of block copolymers: Towards 300mm CMOS requirements
Raluca Tiron
,
Xavier Chevalier
,
Stéphanie Gaugiran
,
J. Pradelles
,
H. Fontaine
,
et al.
Proceedings of SPIE, the International Society for Optical Engineering , 2012, 8323, pp.83230O.
⟨10.1117/12.916400⟩
Journal articles
hal-00817408v1
Actions
Share
Gmail
Facebook
Twitter
LinkedIn
More
Procédé de préparation d'un film de copolymère à blocs destiné à la création d'un masque de nanolithographie
Xavier Chevalier
,
Christophe Navarro
,
Marc Zelsmann
,
Cindy Gomes Correia
,
Guillaume Fleury
France, N° de brevet: WO2020234549 / FR3096281. 2019
Patents
hal-03778177v1
Actions
Share
Gmail
Facebook
Twitter
LinkedIn
More
Lithographically Defined Cross-Linkable Top Coats for Nanomanufacturing with High-χ Block Copolymers
Xavier Chevalier
,
Cindy Gomes Correia
,
Gwenaelle Pound-Lana
,
Philippe Bézard
,
Matthieu Sérégé
,
et al.
Journal articles
hal-03218670v1
Actions
Share
Gmail
Facebook
Twitter
LinkedIn
More
Contact hole shrink by directed self-assembly: Process integration and stability monitored on 300 mm pilot line
Isabelle Servin
,
Raluca Tiron
,
Ahmed Gharbi
,
Maxime Argoud
,
Karine Jullian
,
et al.
Journal articles
hal-01798622v1
Actions
Share
Gmail
Facebook
Twitter
LinkedIn
More
Multifunctional Top-Coats Strategy for DSA of High-χ Block Copolymers
Xavier Chevalier
,
Cindy Gomes Correia
,
Gwenaelle Pound-Lana
,
Philippe Bézard
,
Matthieu Sérégé
,
et al.
Journal articles
hal-03448382v1
Actions
Share
Gmail
Facebook
Twitter
LinkedIn
More
Precise control of template affinity achieved by UV-assisted graphoepitaxy approach on silicon nanowires applications
Patricia Pimenta-Barros
,
Guillaume Claveau
,
Maxime Argoud
,
Zdenek Chalupa
,
Nacima Allouti
,
et al.
Conference papers
cea-02185301v1
Actions
Share
Gmail
Facebook
Twitter
LinkedIn
More
Pillars fabrication by DSA lithography: material and process options
Ahmed Gharbi
,
Patricia Pimenta-Barros
,
Olivia Saouaf
,
Gabriel Reynaud
,
Laurent Pain
,
et al.
Advances in Patterning Materials and Processes XXXV , Feb 2018, San Jose, United States. pp.105860Q,
⟨10.1117/12.2297414⟩
Conference papers
cea-02087039v1
Actions
Share
Gmail
Facebook
Twitter
LinkedIn
More
Optimization of block copolymer self-assembly through graphoepitaxy: A defectivity study
Raluca Tiron
,
Xavier Chevalier
,
Christophe Couderc
,
Jonathan Pradelles
,
Jessy Bustos
,
et al.
Journal articles
hal-00951472v1
Actions
Share
Gmail
Facebook
Twitter
LinkedIn
More
Self-organization and dewetting kinetics in sub-10 nm diblock copolymer line/space lithography
Xavier Chevalier
,
Gwenaelle Pound-Lana
,
Cindy Gomes Correia
,
Sébastien Cavalaglio
,
Benjamin Cabannes-Boué
,
et al.
Journal articles
hal-04013897v1
Actions
Share
Gmail
Facebook
Twitter
LinkedIn
More
Design of new block-copolymer systems to achieve thick-films with defect-free structures for applications of DSA into lithographic large nodes
Xavier Chevalier
,
Paul Coupillaud
,
Geoffrey Lombard
,
Célia Nicolet
,
Julien Beausoleil
,
et al.
ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXIII , 9779, pp.Art. No. 977913, 2016, Book Series: Proceedings of SPIE, ISBN:978-1-5106-0014-0.
⟨10.1117/12.2219214⟩
Book sections
hal-01406087v1
Actions
Share
Gmail
Facebook
Twitter
LinkedIn
More
Top-coats for scalable nano-manufacturing with high-χ block copolymers in lithographic applications
Xavier Chevalier
,
Cindy Gomes Correia
,
Gwenaelle Pound-Lana
,
Philippe Bézard
,
Matthieu Sérégé
,
et al.
SPIE Advanced Lithography conference – Alternative Lithographic Technologies , Feb 2021, San Jose, USA, France. pp.26,
⟨10.1117/12.2583717⟩
Conference papers
hal-03452942v1
Actions
Share
Gmail
Facebook
Twitter
LinkedIn
More
Etching of sub-10 nm half-pitch high chi block copolymers for directed self-assembly (DSA) application
Maria Gabriela Gusmão Cacho
,
Patricia Pimenta-Barros
,
Maxime Argoud
,
Christophe Navarro
,
Kaumba Sakavuyi
,
et al.
Journal articles
hal-03490365v1
Actions
Share
Gmail
Facebook
Twitter
LinkedIn
More
Graphoepitaxy integration and pattern transfer of lamellar silicon-containing high-chi block copolymers
Marc Zelsmann
,
Philippe Bézard
,
Xavier Chevalier
,
Antoine Legrain
,
Christophe Navarro
,
et al.
Conference papers
hal-01954390v1
Actions
Share
Gmail
Facebook
Twitter
LinkedIn
More
Probing Self-Assembly of Cylindrical Morphology Block Copolymer Using in Situ and ex Situ Grazing Incidence Small-Angle X-ray Scattering: The Attractive Case of Graphoepitaxy
Mireille Maret
,
Raluca Tiron
,
Xavier Chevalier
,
Patrice Gergaud
,
Ahmed Gharbi
,
et al.
Journal articles
hal-01369892v1
Actions
Share
Gmail
Facebook
Twitter
LinkedIn
More
Scaling-down lithographic dimensions with block-copolymer materials: 10-nm-sized features with poly(styrene)-block-poly(methylmethacrylate)
Xavier Chevalier
,
Célia Nicolet
,
Raluca Tiron
,
Ahmed Gharbi
,
Maxime Argoud
,
et al.
Journal articles
hal-00926366v1
Actions
Share
Gmail
Facebook
Twitter
LinkedIn
More