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authFullName_s : Christophe Navarro

Block copolymer technology applied to nanoelectronics

Salomé Tallegas , Thierry Baron , Guillaume Gay , Claire Aggrafeil , Billel Salhi , et al.
physica status solidi (c), 2013, 10 (9), pp.1195-1206. ⟨10.1002/pssc.201300002⟩
Journal articles istex hal-02114577v1

Top-coats for scalable nano-manufacturing with high-χ block copolymers in lithographic applications

Xavier Chevalier , Cindy Gomez Correia , Gwenaelle Pound-Lana , Philippe Bézard , Matthieu Sérégé , et al.
Advances in Patterning Materials and Processes XXXVIII, Feb 2021, Online Only, France. pp.26, ⟨10.1117/12.2583717⟩
Conference papers hal-03448358v1

Pattern density multiplication by direct self assembly of block copolymers: Towards 300mm CMOS requirements

Raluca Tiron , Xavier Chevalier , Stéphanie Gaugiran , J. Pradelles , H. Fontaine , et al.
Proceedings of SPIE, the International Society for Optical Engineering, 2012, 8323, pp.83230O. ⟨10.1117/12.916400⟩
Journal articles hal-00817408v1

Procédé de préparation d'un film de copolymère à blocs destiné à la création d'un masque de nanolithographie

Xavier Chevalier , Christophe Navarro , Marc Zelsmann , Cindy Gomes Correia , Guillaume Fleury
France, N° de brevet: WO2020234549 / FR3096281. 2019
Patents hal-03778177v1
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Lithographically Defined Cross-Linkable Top Coats for Nanomanufacturing with High-χ Block Copolymers

Xavier Chevalier , Cindy Gomes Correia , Gwenaelle Pound-Lana , Philippe Bézard , Matthieu Sérégé , et al.
ACS Applied Materials & Interfaces, 2021, 13 (9), pp.11224-11236. ⟨10.1021/acsami.1c00694⟩
Journal articles hal-03218670v1

Contact hole shrink by directed self-assembly: Process integration and stability monitored on 300 mm pilot line

Isabelle Servin , Raluca Tiron , Ahmed Gharbi , Maxime Argoud , Karine Jullian , et al.
Japanese Journal of Applied Physics, 2014, 53 (6S), ⟨10.7567/JJAP.53.06JC05⟩
Journal articles hal-01798622v1
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Multifunctional Top-Coats Strategy for DSA of High-χ Block Copolymers

Xavier Chevalier , Cindy Gomes Correia , Gwenaelle Pound-Lana , Philippe Bézard , Matthieu Sérégé , et al.
Journal of Photopolymer Science and Technology, 2021, 34 (1), pp.11-16. ⟨10.2494/photopolymer.34.11⟩
Journal articles hal-03448382v1

Precise control of template affinity achieved by UV-assisted graphoepitaxy approach on silicon nanowires applications

Patricia Pimenta-Barros , Guillaume Claveau , Maxime Argoud , Zdenek Chalupa , Nacima Allouti , et al.
Novel Patterning Technologies 2018, Feb 2018, San Jose, Canada. pp.11, ⟨10.1117/12.2297407⟩
Conference papers cea-02185301v1
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Pillars fabrication by DSA lithography: material and process options

Ahmed Gharbi , Patricia Pimenta-Barros , Olivia Saouaf , Gabriel Reynaud , Laurent Pain , et al.
Advances in Patterning Materials and Processes XXXV, Feb 2018, San Jose, United States. pp.105860Q, ⟨10.1117/12.2297414⟩
Conference papers cea-02087039v1

Optimization of block copolymer self-assembly through graphoepitaxy: A defectivity study

Raluca Tiron , Xavier Chevalier , Christophe Couderc , Jonathan Pradelles , Jessy Bustos , et al.
Journal of Vacuum Science and Technology, 2011, 29 (6), pp.Art Nb: 06F206. ⟨10.1116/1.3659714⟩
Journal articles hal-00951472v1
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Self-organization and dewetting kinetics in sub-10 nm diblock copolymer line/space lithography

Xavier Chevalier , Gwenaelle Pound-Lana , Cindy Gomes Correia , Sébastien Cavalaglio , Benjamin Cabannes-Boué , et al.
Nanotechnology, 2023, 34 (17), pp.175602. ⟨10.1088/1361-6528/acb49f⟩
Journal articles hal-04013897v1

Design of new block-copolymer systems to achieve thick-films with defect-free structures for applications of DSA into lithographic large nodes

Xavier Chevalier , Paul Coupillaud , Geoffrey Lombard , Célia Nicolet , Julien Beausoleil , et al.
ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXIII, 9779, pp.Art. No. 977913, 2016, Book Series: Proceedings of SPIE, ISBN:978-1-5106-0014-0. ⟨10.1117/12.2219214⟩
Book sections hal-01406087v1
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Top-coats for scalable nano-manufacturing with high-χ block copolymers in lithographic applications

Xavier Chevalier , Cindy Gomes Correia , Gwenaelle Pound-Lana , Philippe Bézard , Matthieu Sérégé , et al.
SPIE Advanced Lithography conference – Alternative Lithographic Technologies, Feb 2021, San Jose, USA, France. pp.26, ⟨10.1117/12.2583717⟩
Conference papers hal-03452942v1
Image document

Etching of sub-10 nm half-pitch high chi block copolymers for directed self-assembly (DSA) application

Maria Gabriela Gusmão Cacho , Patricia Pimenta-Barros , Maxime Argoud , Christophe Navarro , Kaumba Sakavuyi , et al.
Microelectronic Engineering, 2020, 230, pp.111369 -. ⟨10.1016/j.mee.2020.111369⟩
Journal articles hal-03490365v1

Graphoepitaxy integration and pattern transfer of lamellar silicon-containing high-chi block copolymers

Marc Zelsmann , Philippe Bézard , Xavier Chevalier , Antoine Legrain , Christophe Navarro , et al.
SPIE Advanced Lithography, 2018, San José, United States. ⟨10.1117/12.2299337⟩
Conference papers hal-01954390v1

Probing Self-Assembly of Cylindrical Morphology Block Copolymer Using in Situ and ex Situ Grazing Incidence Small-Angle X-ray Scattering: The Attractive Case of Graphoepitaxy

Mireille Maret , Raluca Tiron , Xavier Chevalier , Patrice Gergaud , Ahmed Gharbi , et al.
Macromolecules, 2014, 47 (20), pp.7221-7229. ⟨10.1021/ma501453k⟩
Journal articles hal-01369892v1

Scaling-down lithographic dimensions with block-copolymer materials: 10-nm-sized features with poly(styrene)-block-poly(methylmethacrylate)

Xavier Chevalier , Célia Nicolet , Raluca Tiron , Ahmed Gharbi , Maxime Argoud , et al.
Journal of Micro-Nanolitography MEMS and MOEMS, 2013, 12 (3), pp.Nb 031102. ⟨10.1117/1.JMM.12.3.031102⟩
Journal articles hal-00926366v1