Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
Philippe Rodriguez
,
Romain Famulok
,
Yannick Le Friec
,
Jean-Philippe Reynard
,
Benoit-Noël Bozon
,
et al.
Journal articles
cea-01586412v1
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Development and application of the Oxide Stress Separation technique for the measurement of ONO leakage currents at low electric fields in 40nm floating gate embedded-flash memory
Adam Dobri
,
Simon Jeannot
,
Fausto Piazza
,
Carine Jahan
,
Jean Coignus
,
et al.
Journal articles
hal-02003020v1
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Oxide Stress Separation technique for the assessment of Inter-Gate Dielectric integrity in 40 nm Flash memory cells,
Adam Dobri
,
Simon Jeannot
,
Fausto Piazza
,
Carine Jahan
,
Jean Coignus
,
et al.
46th IEEE Semiconductor Interface Specialists Conference (SISC) , IEEE, Dec 2015, Arlington, United States. pp.12.15
Conference papers
hal-02015384v1
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Evaluation of ONO compatibility with high-k metal gate stacks for future embedded flash products
Adam Dobri
,
Dann Morillon
,
Simon Jeannot
,
Fausto Piazza
,
Carine Jahan
,
et al.
2017 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS) , Apr 2017, Athens, Greece. pp.117-119,
⟨10.1109/ULIS.2017.7962616⟩
Conference papers
hal-02014190v1
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