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authFullName_s : Aloïs Arrighi
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A simple KPFM-based approach for electrostatic free topographic measurements: the case of MoS2 on SiO2

Aloïs Arrighi , Nathan Ullberg , Vincent Derycke , Benjamin Grévin
Nanotechnology, 2023, 34 (21), pp.215705. ⟨10.1088/1361-6528/acbe02⟩
Journal articles cea-03787746v1
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Passivation of Bi$_2$Te$_3$ topological insulator by transferred CVD‐graphene: toward intermixing‐free interfaces

Regina Galceran , Frédéric Bonell , Lorenzo Camosi , Guillaume Sauthier , Zewdu M Gebeyehu , et al.
Advanced Materials Interfaces, 2022, 9 (36), pp.2201997. ⟨10.1002/admi.202201997⟩
Journal articles hal-04006131v1