@inproceedings{pimentabarros:cea-02185301, TITLE = {{Precise control of template affinity achieved by UV-assisted graphoepitaxy approach on silicon nanowires applications}}, AUTHOR = {Pimenta-Barros, Patricia and Claveau, Guillaume and Argoud, Maxime and Chalupa, Zdenek and Allouti, Nacima and Comboroure, Corinne and Chamiot-Maitral, Ga{\"e}lle and Posseme, Nicolas and Pain, Laurent and Tiron, Raluca and Navarro, Christophe and Nicolet, C{\'e}lia and Cayrefourcq, Ian}, URL = {https://cea.hal.science/cea-02185301}, BOOKTITLE = {{Novel Patterning Technologies 2018}}, ADDRESS = {San Jose, Canada}, PUBLISHER = {{SPIE}}, PAGES = {11}, YEAR = {2018}, MONTH = Feb, DOI = {10.1117/12.2297407}, KEYWORDS = {Directed Self-Assembly (DSA) ; Graphoepitaxy ; Surface affinity ; UV modification ; Nanowires ; Etching ; Block-copolymers}, HAL_ID = {cea-02185301}, HAL_VERSION = {v1}, }