The evolution of the fraction of Er ions sensitized by Si nanostructures in silicon-rich silicon oxide thin films - CEA - Commissariat à l’énergie atomique et aux énergies alternatives Access content directly
Journal Articles Nanotechnology Year : 2009

The evolution of the fraction of Er ions sensitized by Si nanostructures in silicon-rich silicon oxide thin films

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cea-01989752 , version 1 (22-01-2019)

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  • HAL Id : cea-01989752 , version 1

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P. Noe, H. Okuno, J.-B. Jager, E Delamadeleine, O. Demichel, et al.. The evolution of the fraction of Er ions sensitized by Si nanostructures in silicon-rich silicon oxide thin films. Nanotechnology, 2009, 20 (35), pp.355704. ⟨cea-01989752⟩
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