%0 Journal Article %T Grazing incident X-ray fluorescence combined with X-ray reflectometry metrology protocol of telluride-based films using in-lab and synchrotron instruments %+ Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI) %+ Université Grenoble Alpes [2016-2019] (UGA [2016-2019]) %+ Laboratoire National Henri Becquerel (LNHB) %+ Synchrotron ELETTRA %A Pessoa, W. %A Roule, A. %A Nolot, E. %A Mazel, Y. %A Bernard, M., M. %A Lépy, M.-C. %A Ménesguen, Y. %A Novikova, A. %A Gergaud, P. %A Brigidi, F. %A Eichert, D. %< avec comité de lecture %@ 0584-8547 %J Spectrochimica Acta Part B: Atomic Spectroscopy %I Elsevier %V 149 %P 143 - 149 %8 2018-11 %D 2018 %R 10.1016/j.sab.2018.07.003 %K GIXRF %K XRR %K XPS %K Mass spectrometry %K Tellurium %K Thin films %Z Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci]Journal articles %X Telluride films are widely applied in data storage devices (advanced resistive memories, DVDs and Blue-rays disks), photovoltaic cells and infrared detectors. The properties of thin telluride alloys are deeply influenced by their chemical composition and compositional depth profile, whereas surface/interface effects may become preponderant in ultrathin films. The combination of X-ray reflectometry (XRR) and grazing-incidence X-ray fluorescence (GIXRF) is particularly adequate to probe these complex thin layered materials. In this paper, we evaluate the performances of Lab-based and synchrotron-based XRR/GIXRF strategies to characterize ultrathin (<10 nm) amorphous titanium‑tellurium films elaborated by Physical Vapor Deposition (PVD), and capped in situ with 5 nm‑tantalum passivation layer. We highlighted the impact of the instrumental setup on the qualitative XRR and GIXRF data and on the quantitative information deduced from the combined analysis. Both synchrotron-based and Lab-based strategies were sensitive enough to track the impact of small PVD process changes on the chemical depth-profiles, and to unambiguously reveal undesired tantalum‑tellurium inter-diffusion that was confirmed by X-Ray Photoelectron Spectroscopy. %G English %L cea-01917750 %U https://cea.hal.science/cea-01917750 %~ CEA %~ UGA %~ DRT %~ CEA-UPSAY %~ UNIV-PARIS-SACLAY %~ CEA-UPSAY-SACLAY %~ LETI %~ LIST %~ CEA-GRE %~ DM2I %~ UGA-COMUE %~ GS-ENGINEERING %~ GS-COMPUTER-SCIENCE %~ DIN