@article{rodriguez:cea-01586412, TITLE = {{Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM}}, AUTHOR = {Rodriguez, Philippe and Famulok, Romain and Le Friec, Yannick and Reynard, Jean-Philippe and Bozon, Benoit-No{\"e}l and Boyer, Flore and Dabertrand, Karen and Jahan, Carine and Favier, Sylvie and Mazel, Yann and Previtali, Bernard and Gergaud, Patrice and Nemouchi, Fabrice}, URL = {https://cea.hal.science/cea-01586412}, JOURNAL = {{Materials Science in Semiconductor Processing}}, PUBLISHER = {{Elsevier}}, VOLUME = {71}, PAGES = {433 - 440}, YEAR = {2017}, MONTH = Sep, DOI = {10.1016/j.mssp.2017.08.033}, KEYWORDS = {Tungsten ; Contact ; Interconnects ; Liner ; Low resistance ; PCRAM}, PDF = {https://cea.hal.science/cea-01586412/file/Rodrig2017a.pdf}, HAL_ID = {cea-01586412}, HAL_VERSION = {v1}, }