Selective etching of Pt with respect to PtSi using a sacrificial low temperature germanidation process - Direction de la recherche technologique
Journal Articles Applied Physics Letters Year : 2007

Selective etching of Pt with respect to PtSi using a sacrificial low temperature germanidation process

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Engineering Sciences [physics]
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Submitted on : Wednesday, September 18, 2024-3:44:25 PM

Last modification on : Thursday, September 19, 2024-3:20:31 AM

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hal-00255853 , version 1 (18-09-2024)

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Nicolas Breil, Aomar Halimaoui, Thomas Skotnicki, Emmanuel Dubois, Guilhem Larrieu, et al.. Selective etching of Pt with respect to PtSi using a sacrificial low temperature germanidation process. Applied Physics Letters, 2007, 91, pp.232112-1-3. ⟨10.1063/1.2821143⟩. ⟨hal-00255853⟩

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